Development

Deposition stages

The production of ion implanted targets or deposited thin film layers formed of enriched stable isotopes requires mass selected ion beams with an energy ranging from several tens of kV down to soft-landing conditions. The need of these extreme modes of operation initiated the design and construction of two different deposition stages downstream to the separator magnet. In the former case, when implantation of mass selected ions with an intensity of 1e15 to 1e16 ions/cm2 is planned, a multi-functional vacuum chamber is being installed and will be operational in the end of 2009. The chamber is designed to comprise a rotational plate to host various charged particle and detectors and electron spectrometes, as well as specific conditions of the target (heating/cooling, high-voltage, rotation, 3D positioning) are provided.

hunyadi@atomki.hu