Institute for Nuclear Research
MTA Certificate of Research Excellence

Subsurface implantation

Core competence Plasma and ion-beam technologies
Method Ionbeam Implantation with variable-energy beams
Contact person
Szakmai leírás

Low energy multiply charged ions (e. g.  Si, Ca, Au, Ag) are possible to be generated by Electron Cyclotron Resonance Ion Source (ECRIS) in order to modify the material’s surfaces (e.g. Titanium, Zirconia)  on nanoscale, to obtain functional surfaces of implants and restorations. Irradiation chamber is developed to implant the ions in a controlled and effective way.

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