|Core competence||Plasma and ion-beam technologies|
|Method||Ionbeam Implantation with variable-energy beams|
Low energy multiply charged ions (e. g. Si, Ca, Au, Ag) are possible to be generated by Electron Cyclotron Resonance Ion Source (ECRIS) in order to modify the material’s surfaces (e.g. Titanium, Zirconia) on nanoscale, to obtain functional surfaces of implants and restorations. Irradiation chamber is developed to implant the ions in a controlled and effective way.