Thin films and layered structures play important role not only in many applications, but have significant point in development and study of materials with new and unique properties. In our laboratory several techniques available for preparation of such samples. Magnetron sputtering is a convenient method to deposit thin films with a thickness of a few nanometers. Atomic Layer Deposition (ALD ) or Molecular beam Epitaxy (MBE) allows to deposit thin films layer by layer, even one atomic layer.

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