Atommagkutató Intézet

APHA Szerző - Speliotis Th.⁴

**P21642**
*Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography.*
Szerzők	Chatzichristidi M., Rajta I., Speliotis Th., Valamontes E. S., Goustouridis D., Argitis P., Raptis I.
Megjelenés helye	Microsystem Technologies 14 (2008) 1423
Impakt faktor	1.229²⁰⁰⁸
Jelleg	Scientific paper, proceedings
Témák	Developm. of Instr. and Methods
Linkek	DOI Hivatkozások (1)

	Total	Headed by ATOMKI under name of the author	Part of the author	Part of the author & ATOMKI
Publications:	1	0	0.143	0
^SCIPublications:	0	0	0	0
Cited publications:	1	0	0.143	0
Non-locally cited publications:	1	0	0.143	0
Cited ^SCIpublications:	0	0	0	0
Non-locally cited ^SCIpublications:	0	0	0	0
^SCICited publications:	1	0	0.143	0
Non-locally ^SCIcited publications:	1	0	0.143	0
^SCICited ^SCIpublications:	0	0	0	0
Non-locally ^SCIcited ^SCIpublications:	0	0	0	0
Citations:	1	0	0.143	0
Non-local citations:	1	0	0.143	0
SCICitations:	1	0	0.143	0
Non-local ^SCIcitations:	1	0	0.143	0
Impact^~2008:	1.229	0	0.143	0
Averaged impact:	1.229	0	0.143	0
^SCIaveraged impact:	0	0	0	0
Citational effectivity:	1	0	0.143	0
Non-local citational effectivity:	1	0	0.143	0
SCIcitational effectivity:	1	0	0.143	0
Non-local ^SCIcitational effectivity:	1	0	0.143	0
Publications, n:	6	0	0	0
^SCIPublications, n:	0	0	0	0
Cited publications, n:	6	0	0	0
Non-locally cited publications, n:	6	0	0	0
Cited ^SCIpublications, n:	0	0	0	0
Non-locally cited ^SCIpublications, n:	0	0	0	0
^SCICited publications, n:	6	0	0	0
Non-locally ^SCIcited publications, n:	6	0	0	0
^SCICited ^SCIpublications, n:	0	0	0	0
Non-locally ^SCIcited ^SCIpublications, n:	0	0	0	0
z-index:	0	0	0	0