APHA Szerző - Goustouridis D.4

P21642

 Aqueous base developable: easy stripping, high aspect ratio negative photoresist for optical and proton beam lithography.

Szerzők Chatzichristidi M.,  Rajta I.,  Speliotis Th.,  Valamontes E. S.,  Goustouridis D.,  Argitis P.,  Raptis I.
Megjelenés helye Microsystem Technologies 14 (2008) 1423
Impakt faktor 1.2292008
Jelleg Scientific paper, proceedings
Témák Developm. of Instr. and Methods
Linkek DOI Hivatkozások (1)

Szerzői Táblázat

Total Headed by ATOMKI under name
of the author
Part of the author Part of the author & ATOMKI
Publications:100.1430
SCIPublications:0000
Cited publications:100.1430
Non-locally cited publications:100.1430
Cited SCIpublications:0000
Non-locally cited SCIpublications:0000
SCICited publications:100.1430
Non-locally SCIcited publications:100.1430
SCICited SCIpublications:0000
Non-locally SCIcited SCIpublications:0000
Citations:100.1430
Non-local citations:100.1430
SCICitations:100.1430
Non-local SCIcitations:100.1430
Impact~2008:1.22900.1430
Averaged impact:1.22900.1430
SCIaveraged impact:0000
Citational effectivity:100.1430
Non-local citational effectivity:100.1430
SCIcitational effectivity:100.1430
Non-local SCIcitational effectivity:100.1430
Publications, n:6000
SCIPublications, n:0000
Cited publications, n:6000
Non-locally cited publications, n:6000
Cited SCIpublications, n:0000
Non-locally cited SCIpublications, n:0000
SCICited publications, n:6000
Non-locally SCIcited publications, n:6000
SCICited SCIpublications, n:0000
Non-locally SCIcited SCIpublications, n:0000
z-index:0000